ME-2240 is a potassium monopersulfate based microetch. ME-2240 provides superior surface topography and extended bath life when compared to generic sodium persulfate microetch.

CONTACT NU-SOURCE TO QUALIFY FOR YOUR DISCOUNTED PRICE.

DC-3615 is a highly concentrated developer solution designed for use in photoresist and soldermask developing processes. Formulated using water softening agents, working solutions of DC-3615 can be made using tap water with up to 400 ppm’s of
dissolved solids without forming significant hardness scale. DC-3615 also contains cleaning compounds that help break up resist residues to prevent deposition and build up in process and control equipment. The IMAGEPRO developing system
combines high quality with ease of use to provide a superior developing system.

CONTACT NU-SOURCE TO QUALIFY FOR YOUR DISCOUNTED PRICE.

CC-4405 is a highly concentrated sodium chlorate based oxidizer for use with cupric chloride etching processes. Our ready-to-use, liquid formulation provides the safest, most stable
oxidizer to handle. Proprietary rate enhancers afford substantially increased etch rates over generic sodium chlorate, hydrogen peroxide and chlorine gas. When used in conjunction
with the ETCHPRO CC-4000, CC-4405 provides the most consistent, efficient and economical etching process available.

CONTACT NU-SOURCE TO QUALIFY FOR YOUR DISCOUNTED PRICE.